Theory and Application of Laser Chemical Vapor Deposition

ISBN: 9780306449369

出版社: Springer

出版年: 1995-10-31

页数: 408

定价: USD 209.00

装帧: Hardcover

内容简介

In this monograph, the authors offer a comprehensive examination of the latest research on Laser Chemical Vapor Deposition (LCVD). Chapters explore the physics of LCVD as well as the principles of a wide range of related phenomena-including laser-matter interactions, heat transfer, fluid flow, chemical kinetics, and adsorption. With this reference, researchers will discover how to apply these principles to developing theories about various types of LCVD processes; gain greater insight into the basic mechanisms of LCVD; and obtain the ability to design and control an LCVD system.